Photoresistzusammensetzung für DUV-Strahlung und Verfahren zu ihrer Benutzung

Photoresist composition for deep ultraviolet radiation and process for its use

Composition de photoréserve pour l'UV profond et procédé pour son utilisation

Abstract

The present invention relates to a radiation-sensitive resist composition comprising (a) a radiation-sensitive acid generator, (b) a substituted androstane, and (c) a copolymer binder.

Claims

Description

Topics

Download Full PDF Version (Non-Commercial Use)

Patent Citations (3)

    Publication numberPublication dateAssigneeTitle
    US-4491628-AJanuary 01, 1985International Business Machines CorporationPositive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
    US-5045431-ASeptember 03, 1991International Business Machines CorporationDry film, aqueous processable photoresist compositions
    US-5071730-ADecember 10, 1991International Business Machines CorporationLiquid apply, aqueous processable photoresist compositions

NO-Patent Citations (2)

    Title
    REICHMANIS ET AL., CHEMISTRY OF MATERIALS, vol. 3, 1991, pages 395
    REICHMANIS ET AL: "A Novel Approach to O-nitrobenzyl Photochemistry for Resists", JOURNAL OF VACUUM SCIENCE TECHNOLOGY, vol. 19, no. 4, 1981, XP001391512

Cited By (7)

    Publication numberPublication dateAssigneeTitle
    EP-0878738-A2November 18, 1998Fuji Photo Film Co., Ltd.Positive resist composition
    EP-0878738-A3June 23, 1999Fuji Photo Film Co., Ltd.Positive resist composition
    EP-0880074-A1November 25, 1998Lucent Technologies Inc.Matériau sensible aux rayonnements et procédé pour la production d'un dispositif utilisant ce matériau sensible aux rayonnements
    EP-0930541-A1July 21, 1999JSR CorporationRadiation sensitive resin composition
    US-5879857-AMarch 09, 1999Lucent Technologies Inc.Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
    US-6180316-B1January 30, 2001Jsr CorporationRadiation sensitive resin composition
    US-6245485-B1June 12, 2001Fuji Photo Film Co., Ltd.Positive resist composition